Deposition/printing of materials with sub-1 μm precision and size (cross sections) is required for optical and electrical micro-devices. Crystalline c-ITO (Indium tin oxide) nanostructures were patterned on glass with a precision that formed gaps of 20-50 nm between individual disks or lines of ∼ 250 nm diameter or width. The absorbed energy density [J/cm3] followed the second order dependence on pulse energy. This facilitated high resolution and precision for nanoscale laser writing at the 515 nm laser wavelength. Patterns for optical elements such as circular gratings and micro-disks were laser printed using ITO as a resist. Unexposed amorphous a-ITO was chemically removed in aqueous 1% vol. HF solution. This use of a-ITO as solid-resist is promising for metamaterial and micro-optical applications.