Large-area nanostructuring of glasses using intense laser beam remains a difficult task due to the extreme non-linear absorption of the laser energy by the material. Precise optimization of the process parameters is essential for fabricating nanostructures with large area coverage. In this study, we report the findings on creating high spatial frequency LIPSS (HSFL) on borosilicate glass through direct laser writing, using a femtosecond laser with a wavelength λ = 800 nm, pulse duration τ = 35 fs, and repetition frequency frep = 1 kHz. The orientation of the HSFL was found to be parallel to the electric field vector. We measured the single pulse ablation threshold (Fth=3.87±0.26 J/cm2) and incubation factor (S=0.68±0.03) of Borosilicate glasses for precise control for large area surface structuring. Single-spot experiments indicate that uniform LIPSS formation is limited by melt formation inside the irradiated area for higher fluence and a larger number of irradiated laser pulses. The orientation of the scan axis with the laser beam polarization is found to be significantly influencing the uniformity of the large area processing. We found that the orientation of the scan axis with the laser beam polarization significantly affects the uniformity of large-area processing, with redeposition and melt formation being higher when the scan axis is perpendicular to the laser beam polarization. Large-area processing of the borosilicate glass surface is done by line-by-line scanning over the surface with a scan orientation parallel to the laser beam polarization. The optical characterization reveals that the transmittance and reflectance of the borosilicate glass decreased significantly after processing. Also, the wettability of the surface has been changed from hydrophilic to super hydrophilic after processing. These chemical contamination-free and uniformly distributed structures have potential applications in optics, microfluidics, photovoltaics, and biomaterials.