This work examines the impact of the nozzle-substrate distance (NSD) on the structural, optical and electrical properties of fluorine-doped tin oxide (FTO) thin films. The films were grown by spray pyrolysis with the chemical formulation of “Streaming Process for Electroless and Electrochemical Deposition technology” (SPEED) technique. The characterization technique such as XRD, SEM, UV-spectrophotometry and Hall Effect measurement were employed for studying the structural, optical and electrical properties of the FTO films at various NSD. The NSD was varied from 25-32cm amid the experiment. All FTO films are polycrystalline, tetragonal crystal structure with strong orientation along the (211) reflection. SEM properties study demonstrated slight reliance on NSD and have uniform films which are a disciple to substrate at NSD of 27 and 30 cm, however, crumbled at 25cm and 32cm NSD. They likewise displayed a mud-look like morphology and smooth white appearance. The average optical transmittance of all films is over 80% in the noticeable at UV range. The band gap investigation demonstrates the average value of 3.5eV and the resistivity was found to diminish with increasing NSD at 30 cm. Both mobility and carrier concentration of the FTO films follow a similar trend. The average figure of merit of 4.98 was obtained which is an improvement based on our previous results. The FTO samples grown at 27 and 30 cm NSD in this work are best FTO samples and hence could serve as a promising candidate in dye sensitized solar cells. Therfore, graphene has been employed in different concentrations in our ongoing FTO optimization research so as to further improve on the FTO’s figure of merit.