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The Effect of Microstructure of Molybdenum Target
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Submitted:
24 January 2021
Posted:
25 January 2021
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Abstract
Abstract: Molybdenum (Mo) thin films were sputtered from two kinds of Mo targets with different microstructures under the same sputtering process, and the effect of microstructure of Mo target on morphology, deposition rate and resistance of sputtered film were studied and discussed. The results show that morphological differences between Mo thin films sputtered by Mo targets with different microstructures are very small. The more uniform and finer the grain structures of Mo target, the better the uniformity on thickness and resistance of Mo sputtered film. Moreover, during sputtering process, when Mo target’s grain size is finer and the surface area of grain boundary is higher, the thickness reduction of the target is more homogeneous and the sputtering film has faster deposition velocity. The difference in microstructure of the Mo target has not obvious influence on the grain orientation of sputtering film.
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Subject: Engineering - Automotive Engineering
Copyright: This open access article is published under a Creative Commons CC BY 4.0 license, which permit the free download, distribution, and reuse, provided that the author and preprint are cited in any reuse.
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