Tris-(8-hydroxyquinoline)aluminum (Alq
3; C
27H
18AlN
3O
3), 7,7,8,8-tetracyanoquinodimethane (TCNQ; C
12H
4N
4) and polypyrrole (PPy) were obtained from Sigma Aldrich (Sigma-Aldrich, St. Louis, MO, USA) and required no further purification. Afterwards an Alq
3-TCNQ doped semiconductor was obtained by dissolution of 106 mg (0.3mmol) of Alq
3 and 102 mg (0.5mmol) of TCNQ in 20 ml of ethanol. Doping was carried out during 30 minutes at 425 K in heated reactor Monowave 50 (Anton Paar México, S.A. de C.V. Hidalgo, México) with pressure sensor. The reactor is operated with a borosilicate glass vial and manually closed by a cover with an integrated pressure (0-20 bar) and temperature sensor. The system was cooled and brought to atmospheric pressure, the Alq
3-TCNQ was filtered, washed whit ethanol and dried in vacuum. The Alq
3-TCNQ semiconductor was subsequently deposited on PPy to form a composite film onto different substrates: glass, high-resistivity monocrystalline n-type silicon wafers (c-Si), and coated glass slides with Fluorine-Tin-Oxide (FTO). The glass, and FTO substrates were previously cut and washed consecutively in an ultrasonic bath with solvents: chloroform, ethanol, and acetone. The silicon substrates, however, were cut and later washed with “p” solution (10 mL HF, 15 mL HNO
3, and 300 mL H
2O). For the manufacture of the film, a 10% dispersion of Alq
3-TCNQ was prepared in PPy previously dissolved in cresol. The mixture Alq
3-TCNQ with PPy was dispersed using the G560 shaker of Scientific Industries Vortex-Genie (Bohemia, NY, USA). To obtain the films a syringe was used to apply 0.6 mL on the substrate surface and then spread the dispersion. Subsequently, the films were brought to 55°C for 5 minutes in the drying oven Briteg SC-92898 (Instrumentos Científicos, S.A de C.V.). This accelerated the film fabrication process and prevented the samples from swelling and cracking during drying. Morphological and topographical characteristics were investigated with a ZEISS EVO LS 10 scanning electron microscope (SEM, Carl Zeiss AG. Jena, Germany) and with a Nano AFM atomic force microscope (AFM, Nanosurf AG, Liesta, Switzerland) using an Ntegra platform for the (Alq
3-TCNQ):PPy films deposited on glass and silicon substrates respectively. To verify the main functional groups of the Alq
3-TCNQ semiconductor, a FTIR spectroscopy analysis was performed, using a Nicolet iS5-FT spectrometer (Thermo Fisher Scientific Inc., Waltham, MA, USA)
The UV-vis in films on glass were obtained in the 200-1100 nm wavelength range, on a UV-Vis 300 Unicam spectrophotometer (Thermo Fisher Scientific Inc., Waltham, MA, USA). Finally, the electrical behavior was procured through current-voltage (I-V) measurements in a Keithley 4200-SCS-PK1 auto-ranging pico-ammeter (Tektronix Inc., Beaverton, OR, USA). The evaluation was performed on the FTO/(Alq
3-TCNQ):PPy/Ag device (
Figure 1a), Ag was deposited on top of the layers to act as cathode and the FTO act as anode. I-V curves were obtained under darkness, white, red, orange, yellow, green, blue, and ultraviolet lights in a range of -1.2 to 1.2 V at room temperature. The principal studies of the current-voltage (I-V) characteristics in semiconductors are the ohmic and space-charge-limited currents (SCLC), therefore several investigations as [
42,
43,
54,
55,
56] have identified a typical current density-voltage curve as is showed in
Figure 1b.
From
Figure 1b, two regimes can be identified, the first one is the ohmic regime at low voltages which can be expressed by
when the voltage is increased, the second regime is quadratic called space-charge limited current (SCLC) regime defined by
where
denote the current density,
is the electronic charge,
is the free carrier density,
is the electron mobility,
is the applied voltage,
is the thickness of the sample,
is the vacuum permittivity and
is the dielectric constant. Generally, at high voltages, a SCLC regime also occurs, but with a higher growth rate than the quadratic regime. In addition to the ohmic and SCLC regimes, it has been identified the ohmic to SCLC transition voltage denoted by
and the trap-filled-limit voltage denoted by
which determines the change from the quadratic regime to another. These transition voltages are defined by
where
is the trap density. Notice that if the transition voltages are determined, from equations (3) and (4), the free carrier density and the trap density can be calculated.