Memristors are two-terminal electronic components that exhibit a relationship between the time integrals of current and voltage across them. They were theorized by Leon Chua in 1971 [
10] and are considered the fourth fundamental passive circuit element alongside resistors, capacitors, and inductors. Electrical modeling of memristors involves mathematically representing their behavior to understand and predict their performance in circuits. The first mathematical models for memristors were developed from a memristor’s equivalent electrical circuit consisting of two resistors connected in series [
14]; improvements were proposed with the use of window functions with adjustable parameters [
15]; this improved the convergence of the model in corner cases where the regions between the doped and undoped semiconductors reach the limit of the thin dielectric layer.
2.2.1. Vourkas Memristor Model
In this Subsection, the macro model for a memristor proposed by [
16] will be explained. The schematic diagram of a memristor macromodel is depicted in
Figure 1(a).
Figure 1(b) represents the typical electrical symbol of a memristor. The cross-section of a memristor is shown in
Figure 1(c), in which a region of insulating material of TiO
2 separates two metal plates that form the terminals of the device.
Two regions of material with different conductivity are distinguished inside the thin insulating material. The region denoted by represents the total thickness of the insulating material. On the other hand, L is the distance between the border of the two regions of the TiO2 composite material, with respect to the border with the lower terminal (metallic contact). The upper region of the TiO2 material develops a low resistance of R value due to the vacancies of oxygen atoms that occur due to the migration of atoms in response to the effect of the intense electric field present in the structure. The upper region is, therefore, considered a doped region extending a distance with a value of . On the other hand, the lower region that receives the oxygen atoms behaves as an insulator and develops a very high resistance, with a value denoted by . In the region with thickness L, a charge transport process develops through the tunneling mechanism, coupled in series with the upper region (), with a lower resistive value. The resistance values in both regions are very different, with a notable difference of , so the Vourkas model focuses on determining only the value of and is considered to develop a proportional resistive value to the width of the tunnel barrier L and that the electron conduction would be dominated by the effective width of the tunnel barrier, which varies as a function of time and the magnitude of voltage applied between the terminals of the device. Also, it is considered that the border between the two regions and, therefore, the value of L changes depending on the migration of oxygen deficiencies due to the effect of an electrical potential applied between the terminals.
The macromodel behavior proposed by [
16] is defined by the Equation
2:
where
I is the current that flows in the memristor,
G is the conductance, and
is the voltage applied between the top and the bottom terminals. Next, the rate of change of
L is defined by:
From quantum mechanics, an expression can be determined for the tunnel resistance,
, whose value is inversely proportional to the product of the transmission coefficient,
, and the effective density of states,
, from the material TiO
2.
is simultaneously a function of the voltage applied between the terminals of the memristor (
), which provides sufficient energy for the electrons to pass through the thin film of the undoped material
L. On the other hand, the resistance
is exponentially proportional to the width of the tunneling barrier (
L). Therefore, the tunnel resistance
is defined by the equation
4:
By making a change of variable, we can rewrite the equation
4, as follows:
In equation
5, a new voltage-dependent parameter,
, is defined, which replaces the voltage-dependent parameters:
, and
. Equation
5, calculates the value of the resistance of a memristor, subject to the state variable
L. The adjustment variable
functions to represent the specific parameters of the material and aspects related to the geometry. The heuristic equation
6 defines the new variable
, as well as its minimum and maximum intervals.
Equation
6, delivers the expected response of
L, as a function of time,
t, and
. Therefore,
represents the largest dimension that
L can reach. On the other hand, the voltage-dependent parameter, denoted as
, and the term
m (adjustment parameter) are used to determine the boundary of the tunnel barrier width. Equation (
6), determines the initial and current position of
L, being defined between the limits of the two boundary values. The parameter
defines both the dynamics of the device and its current state. Its value must be maintained between a valid interval. The on-and-off dynamics of the memristor depend on the structure of the device, mainly on the type of oxide used, which determines the drift speed of the ions that move along
, due to the effect of the electric field. These dynamics are incorporated into the macromodel assuming that the change of
L is fast if
exceeds a certain positive threshold voltage, denoted as
(
<
), or a negative threshold voltage
(
<
). Otherwise, if
is below both thresholds, e.g.
≤
≤
, the change in
L, and therefore, in the memristance is practically zero. The function proposed in [
16] that models the rate of change of
L, as a function of the voltage
and the time,
t, is defined by Equation
7.
The parameters
,
,
b and
c are constants used to adjust the model dynamics. In this case, since the change of memristance is stated to be rapid, if the voltage applied to the terminals of the memristor exceeds any of the threshold voltages of the memristor, then
must be satisfied. The constant
c will be bounded in the interval 0<
c<1. In
Figure 1(a), the schematic diagram of the Vourkas macromodel is presented. The voltage-controlled current source,
, generates a current controlled by the voltage applied to the memristor terminals,
, proportional to
. This current is integrated through the unity value capacitor,
, thus providing the value of
. The voltage-controlled current source,
, evaluates Equation (
5), for which
was previously calculated, through
and, consequently,
, through Equation (
6). Finally, in code block is the SPICE macromodel presented at [
16] and used in this work in all the electrical simulations.
Listing 1: Spice code for the Vourkas macromodel.
.subckt memristor_vourkas plus minus PARAMS:
+ rmin=100 rmax=390 rinit=390 alpha=1e6 beta=10
+ gamma=0.1 vs=1.5 vr=-1.5 eps=0.0001 m=82 fo=310 lo=5
Cr r 0 1 IC={rinit}
Raux r 0 1e12
Gr 0 r value={dr_dt(V(plus)-V(minus))*(st_f(V(plus)-V(minus))
+ *st_f(V(r)-rmin)+st_f(-(V(plus)-V(minus)))*st_f(rmax-V(r)))}
.func dr_dt(y)={-alpha*((y-vr)/(gamma+abs(y-vr)))*st_f(-y+vr)
+ -beta*y*st_f(y-vr)*st_f(-y+vs)-alpha*((y-vs)
+ /(gamma+abs(y-vs)))*st_f(y-vs)}
.func st_f(y)={1/(exp(-y/eps)+1)}
Gpm plus minus value={(V(plus)-V(minus))
+ /((fo*exp(2*L(V(r))))/L(V(r)))}
.func L(y)={lo-lo*m/y}