3.1. Coating Microstructure Characterization
We characterized the microstructure of AgNW, TiN and TiNAgNW-based coatings deposited on CNP y PET substrates, by AFM, SEM imaging, XRD and EDX Analysis. The X-ray Diffraction diffractograms of TiN deposition on flat silicon substrate are shown in
Figure 3.a The data show that TiN coatings are multi-crystalline in the presence of a background RF plasma. The TiN (111) orientation is observed for dual-frequency depositions in contrast to the (200) orientation observed in single frequency deposition. The increase of the ion mean energy at similar input power in dual-frequency plasma compared with the single frequency plasma results in such crystallographic orientation [
35].
Figure 2 gives representative SEM micrographs of flexible PET and CNP coated substrates. The TiN layers were produced at 100
oC and an applied RF power of 20 W, in dual-frequency mode. Despite the apparent local non-uniformity of the AgNWs dispersion shown in the SEM images of the panels (k-l) in
Figure 2, a
hot dropcasting technique enable the production of conducting coatings with good uniformity at larger scale (panel 2.b) with controlled sheet resistance values.
No wrinkling or buckling are observed for TiN-coated CNP substrates, and the cellulose nanofibrils can be clearly seen, suggesting the TiN layer is conformal to the CNP substrate topography. On the other hand, wrinkled structures are observed for TiN coated PET substrates, and strongly depend on the TiN thickness, as shown in panels 2
. For both PET and CNP substrates, delamination phenomena or cracks were observed for synthesis temperatures above 200
oC, starting around existing defects or from the ones induced by the PLD process, and were caused by the thermal degradation of the substrates (see SI). To further evaluate the morphology of these wrinkles, we performed AFM analysis. AFM images and selected profiles of pristine and coated substrates are given in
Figure 4. Panel
shows a typical image of as-synthesized TEMPO CNP substrates. Average and rms roughnesses were obtained from 2x2
AFM images, after average plane levelling of the raw data, without any further data processing. Roughness values are given in
Table 1 for 100 and 250 nm thick coatings. The TiN/CNP substrates exhibit a 36 and 66 % rms roughness increase compared to pristine CNP, whereas it increases by 457 and 577 % for the PET substrates for 100 and 250 nm thick TiN layers, respectively. Strikingly, 100 nm thick TiN/CNP coatings (panel 4
are very similar to TiN depositions obtained on flat inorganic silicon substrates (panel 4
with comparable TiN grains size and distribution.
To explain the difference of microstructure between PET and CNP substrates, one must take into consideration the mechanical properties of both substrates, and investigate wrinkling and buckling mechanisms. The bonding of thin films to substrates is a common but key process for semiconductor stacks fabrication. While buckling mechanism generally leads to thin film failure and is not desired in standard electronic devices, the formation of wrinkles in a thin film may offer improved functionalities for flexible and stretchable electronics. Wrinkling phenomena are observed in coated flexible substrate submitted to a compressive stress, over a wide range of system length scale and materials [
36]. The mechanical stress in coated polymeric substrates can be decomposed in two components: an intrinsic stress
that arises from the thin film deposition process (sputtering, spincoating, vapor deposition,...) and a thermal stress
that develop in thin films deposited above/below room temperature and that originates from the thermal expansion mismatch between the thin film and the substrate [
37]:
where
represents the coefficient of thermal expansion,
,
are the room and the synthesis temperature, respectively.
The interplay of these two components determine
, the total mechanical stress applied to a coating. Wrinkling phenomena occurs when
is positive (compressive) and exceed a corresponding critical wrinkling stress
that depends on the thicknesses, Young modulus and Poisson coefficient of the coating and the substrate, respectively [
14,
38].
TiN coatings produced at room temperature
do not exhibit such wrinkles, because of the absence of thermal stress. With increasing synthesis temperature, TiN wrinkles start to form on PET substrates and their microstructure (wavelength and amplitude) depends on the coating thickness, as shown in the
Figure 2.(d-f). The simple 1D wrinkling model [
39] predicts wrinkle wavelength given by
, where
and
are the film and substrate plane strain moduli, respectively [
40]. We gathered, in
Table 2 typical values of CTE, Poisson ratio and Young modulus of materials constituting our samples. From these values, the theoretical wrinkle wavelengths
=0.95, 1.90 and 3.82
m are expected respectively for the 50, 100 and 200 nm thick TiN coatings on PET substrates. The wrinkle wavelength and its dependence with the TiN thickness are in good agreement with this wrinkling model, and the wrinkle amplitude is proportional to the wrinkle wavelength as suggested by Cerda
et al. [
36]. However, the observed wavelengths are 2-3 times smaller than expected for the 50 nm TiN coatings. This discrepancy can be explained by the difficulty of determining wavelength for smaller amplitude wrinkles.
Strikingly, the coating morphology is different for CNP substrates and strongly depends on the presence of AgNW. Images of 50 to 200 nm thick pure TiN coatings produced at 100
oC on CNP substrates, are given in the
Figure 2.(g-i). No wrinkles are observed, and the RMS roughness decreases by more than 300% compared to TiN/PET. this clearly stems from the almost identical CTE values for TiN and CNP substrates (see
Table 2) which results in a negligible thermal stress (
) during the TiN deposition process. Nevertheless, the presence of AgNW prior to the TiN PLD deposition increases the coating roughness by a factor of 2 and introduces TiN wrinkles that also depend on the coating thickness, as shown in the
Figure 2.(d-f).
In the following, we describe the optoelectronic properties and mechanical robustness of these TiNAgNW coatings. As shown in
Figure 5, an obvious advantage of the incorporation of AgNW in the bare TiN coatings is to decrease the resistivity down to below 100
, while high-quality TiN coatings produced by high temperature (
oC) PLD processes generally exhibit room-temperature electrical resistivity better than 300
[
27,
50]. It is important to highlight our AgNW coatings can be produced by dropcasting and proper drying method with high uniformity achieving reproducible sheet resistance (coef. of variation below 10%).
Figure 5.(a), shows the room temperature electrical resistivity of TiNAgNW nano-composites as a function of the PE-PLD deposition time and processing temperature. A clear improvement of the resistivity is observed, with increasing temperature and deposition time (TiN thickness). We also quantified the transparency of the produced electrodes on TEMPO substrates. The optical transmittance characterization of the produced electrodes with TEMPO substrates are shown in panel
of
Figure 5. The optical transmittance, given at a wavelength of 532 nm, strongly depends on the TiN thickness, and a maximum of
= 63% is observed for a 87
nano-composite coatings, as shown in
Table 3. These optical transmittance are below standard values of ITO/PET (78 80%), or pure AgNW/CNP (76%) substrates. This result probably limits the use of the mentioned nanocomposites as transparent electrodes for photovoltaic applications. However, these TiNAgNW nano-composites exhibit enhanced mechanical properties, and surpass by four orders of magnitude commercial ITO/PET substrates, in terms of electro-mechanical stability. To show that nano-composites produced by the same PE-PLD technique are good candidates for the fabrication of flexible electrodes, we evaluated their electromechanical properties through cyclic fatigue bending tests. Samples were bent from the flat or equilibrium position to a maximum bending strain
.
Figure 5.a) shows a representative 24-hour data of the relative resistance
of a TiNAgNW electrode on CNP (100 nm TiN), measured in a four-probe configuration, as a function of time. During the first 4 hours, the decrease of
is attributed to an improvement of the contact resistance between the copper electrodes and the nano-composites, and during the next cycles, the average
value slowly increases only by 3.4% after 24 hours bending tests for a maximum bending stress
= 1.5 %, whereas an increase higher than 1000% is observed for ITO coatings on polymeric substrates [
51]. We also evaluated the long-term evolution of
for different coatings on both PET and CNP substrates exposed to air. The
Figure 5.d) gives
as a function of the number of days of exposure to air. The data show that pure AgNW coatings are strongly impacted by air exposure with a stronger effect for CNP substrates, and can be understood by a higher permeability to oxygen of CNP substrate compared to PET substrates. Despite their excellent optical and electrical conductivities, AgNW coatings are characterized by a high roughness, low adhesion [
10] to flexible substrates and are subject to oxidation upon air exposure. The deposition of a chemical stable layer of TiN represent an excellent opportunity to overcome the bottleneck of bare AgNW coating for being used as flexible electrodes.