PreprintReviewVersion 1This version is not peer-reviewed
Comprehensive Review on the Impact of Chemical Composition, Plasma Treatment, and Vacuum Ultraviolet (VUV) Irradiation on the Electrical Properties of Organosilicate Films
Version 1
: Received: 1 July 2024 / Approved: 1 July 2024 / Online: 1 July 2024 (12:59:55 CEST)
How to cite:
Baklanov, M. R.; Gismatulin, A. A.; Naumov, S.; Perevalov, T. V.; Gritsenko, V. A.; Vishnevskiy, A. S.; Rakhimova, T. V.; Vorotilov, K. A. Comprehensive Review on the Impact of Chemical Composition, Plasma Treatment, and Vacuum Ultraviolet (VUV) Irradiation on the Electrical Properties of Organosilicate Films. Preprints2024, 2024070106. https://doi.org/10.20944/preprints202407.0106.v1
Baklanov, M. R.; Gismatulin, A. A.; Naumov, S.; Perevalov, T. V.; Gritsenko, V. A.; Vishnevskiy, A. S.; Rakhimova, T. V.; Vorotilov, K. A. Comprehensive Review on the Impact of Chemical Composition, Plasma Treatment, and Vacuum Ultraviolet (VUV) Irradiation on the Electrical Properties of Organosilicate Films. Preprints 2024, 2024070106. https://doi.org/10.20944/preprints202407.0106.v1
Baklanov, M. R.; Gismatulin, A. A.; Naumov, S.; Perevalov, T. V.; Gritsenko, V. A.; Vishnevskiy, A. S.; Rakhimova, T. V.; Vorotilov, K. A. Comprehensive Review on the Impact of Chemical Composition, Plasma Treatment, and Vacuum Ultraviolet (VUV) Irradiation on the Electrical Properties of Organosilicate Films. Preprints2024, 2024070106. https://doi.org/10.20944/preprints202407.0106.v1
APA Style
Baklanov, M. R., Gismatulin, A. A., Naumov, S., Perevalov, T. V., Gritsenko, V. A., Vishnevskiy, A. S., Rakhimova, T. V., & Vorotilov, K. A. (2024). Comprehensive Review on the Impact of Chemical Composition, Plasma Treatment, and Vacuum Ultraviolet (VUV) Irradiation on the Electrical Properties of Organosilicate Films. Preprints. https://doi.org/10.20944/preprints202407.0106.v1
Chicago/Turabian Style
Baklanov, M. R., Tatyana V. Rakhimova and Konstantin A. Vorotilov. 2024 "Comprehensive Review on the Impact of Chemical Composition, Plasma Treatment, and Vacuum Ultraviolet (VUV) Irradiation on the Electrical Properties of Organosilicate Films" Preprints. https://doi.org/10.20944/preprints202407.0106.v1
Abstract
Organosilicate glass (OSG) films are a vital component in modern electronic devices, with their electrical properties playing a crucial role in device performance. This comprehensive review systematically examines the influence of chemical composition, vacuum ultraviolet (VUV) irradiation, and plasma treatment on the electrical properties of OSG films. Through an extensive survey of literature and experimental findings, we elucidate the intricate interplay between these factors and the resultant alterations in electrical conductivity, dielectric constant, and breakdown strength of OSG films. Key focus areas include the impact of diverse organic moieties incorporated into the silica matrix, the effects of VUV irradiation on film properties, and the modifications induced by various plasma treatment techniques. Furthermore, we discuss the underlying mechanisms governing these phenomena, shedding light on the intricate molecular interactions and structural rearrangements occurring within OSG films under different environmental conditions. This review not only consolidates existing knowledge but also identifies gaps in understanding and suggests avenues for future research, thereby advancing our comprehension of OSG film behavior and paving the way for enhanced performance in next-generation electronic and photonic devices.
Keywords
organosilicate glass (OSG); low-k dielectrics; thin film; electrical properties degradation; charge transport; trap energy; chemical composition; bonding configuration; density functional theory (DFT); photoluminescence
Subject
Physical Sciences, Condensed Matter Physics
Copyright:
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
